Sunday, 9 October 2016

CHOOSE-YOUR-PROJECT PROGRAM: ONITSHA GETS DOUBLE, AS OBIANO DOLES OUT N40m

 
By Kingsley Ezekwelu
 

The Anambra state governor, Chief Willie Obiano has specially doubled the fund for the choose-your-project program for Onitsha community to forty million (N40m) Naira, for obvious reasons.

 

This was announced by the governor during the 2016 Ofala Festival of the traditional ruler and Obi of Onitsha, HRM Igwe Nnaemeka Ugochukwu Achebe at the Imeobi Palace ground, Onitsha.

 

The governor had noted that Onitsha Metropolitan city comprises two local governments with large land mass and human population, and explained that the additional amount was due to the commercial city's strategic role in the socio-economic development of the state.

That it was therefore proper that the community be given additional funds in the spirit of equity and fairness.

He described Ofala Festival as an ancient tradition which Ndigbo are proud of and urged the community to sustain and enrich it for posterity.

 

He harped on the need for the people to support Igwe Achebe in the onerous task of administering the affairs of the big commercial community, describing him as a man of integrity.

In his Ofala message, Igwe Achebe x-rayed the state of the nation and happenings globally, and urged the Federal Government to take urgent steps to cushion the heavy burden of the present economic recession on the people and to be more focused in its fight against corruption.

 

He commended Gov Obiano for leading the state with tact and vision even in the face of daunting economic challenges and prayed for a prosperous years ahead for people of the State and the community.

The governor also later attended the "Iwa Ji" Festival of Obosi Kingdom in Idemili North Council Area where he equally announced additional #20 million for the community under the Choose-your-project initiative.



  He called on youths in the community to support the ongoing peace initiative in the town to ensure that they remain on the path of growth and advancement.

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